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Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography
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Document Title
Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography
Author
Atthi N, Dielen M, Sripumkhai W, Pattamang P, Meananeatra R, Saengdee P, Thongsook O, Ranron N, Pankong K, Uahchinkul W, Supadech J, Klunngien N, Jeamsaksiri W, Veldhuizen P, ter Meulen JM
Name from Authors Collection
Scopus Author ID
35488706300
Scopus Author ID
55203603600
Scopus Author ID
57216361571
Affiliations
National Science & Technology Development Agency - Thailand; National Electronics & Computer Technology Center (NECTEC)
Type
Article
Source Title
NANOMATERIALS
Year
2021
Volume
11
Issue
1
Open Access
Green Published, gold
Publisher
MDPI
DOI
10.3390/nano11020339
Format
Abstract
Bio-inspired surfaces with superamphiphobic properties are well known as effective candidates for antifouling technology. However, the limitation of large-area mastering, patterning and pattern collapsing upon physical contact are the bottleneck for practical utilization in marine and medical applications. In this study, a roll-to-plate nanoimprint lithography (R2P NIL) process using Morphotonics' automated Portis NIL600 tool was used to replicate high aspect ratio (5.0) micro-structures via reusable intermediate flexible stamps that were fabricated from silicon master molds. Two types of Morphotonics' in-house UV-curable resins were used to replicate a micro-pillar (PIL) and circular rings with eight stripe supporters (C-RESS) micro-structure onto polycarbonate (PC) and polyethylene terephthalate (PET) foil substrates. The pattern quality and surface wettability was compared to a conventional polydimethylsiloxane (PDMS) soft lithography process. It was found that the heights of the R2P NIL replicated PIL and C-RESS patterns deviated less than 6% and 5% from the pattern design, respectively. Moreover, the surface wettability of the imprinted PIL and C-RESS patterns was found to be superhydro- and oleophobic and hydro- and oleophobic, respectively, with good robustness for the C-RESS micro-structure. Therefore, the R2P NIL process is expected to be a promising method to fabricate robust C-RESS micro-structures for large-scale anti-biofouling application.
Funding Sponsor
National Electronics and Computer Technology Center (NECTEC), Thailand (FleXARs project) [P1951452]
License
CC-BY
Rights
Authors
Publication Source
WOS