EFFECT OF DEPOSITION TIME ON NANOCOLUMNAR TiZrN FILMS GROWN BY REACTIVE MAGNETRON CO-SPUTTERING WITH THE OAD TECHNIQUE

Abstract

Well-separated inclined nanocolumnar TiZrN films were grown on silicon-wafer substrates by reactive magnetron co-sputtering with the oblique-angle-deposition (OAD) technique. The crystal structure, thickness, morphology and chemical composition of the prepared TiZrN films were investigated with the X-ray diffraction technique at the grazing-incidence angle (GIXRD), field-emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray spectroscopy (EDS). The length, diameter and tilt angle of the nanocolumnar TiZrN films were evaluated. The microstructure and chemical composition were analyzed with transmission electron microscopy (TEM). The results indicated that the film crystallinity and physical morphology were influenced by the deposition time due to the self-annealing effect, which occurred during the nanocolumnar growth. Moreover, the hardness and surface wettability of the TiZrN films were studied using a nanoindentater and the water-contact-angle method, respectively. It was found that the hardness and hydrophobic surface of the TiZrN films decreased with the increasing deposition time.