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EXTERNAL-ELECTRIC-FIELD-ENHANCED UNIFORMITY AND DEPOSITION RATE OF A TiO2 FILM PREPARED BY THE SPARKING PROCESS
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Document Title
EXTERNAL-ELECTRIC-FIELD-ENHANCED UNIFORMITY AND DEPOSITION RATE OF A TiO2 FILM PREPARED BY THE SPARKING PROCESS
Author
Thongpan W, Kumpika T, Kantarak E, Panthawan A, Pooseekheaw P, Singjai P, Tuantranont A, Thongsuwan W
Name from Authors Collection
Affiliations
Chiang Mai University; Chiang Mai University; Chiang Mai University; Chiang Mai University; National Science & Technology Development Agency - Thailand; National Electronics & Computer Technology Center (NECTEC)
Type
Article
Source Title
UKRAINIAN JOURNAL OF PHYSICS
ISSN
2071-0186
Year
2018
Volume
63
Issue
9
Open Access
Bronze
Publisher
BOGOLYUBOV INST THEORETICAL PHYSICS NATL ACAD SCI UKRAINE
DOI
10.15407/ujpe63.6.531
Format
Abstract
We have used an external electric field to increase both the uniformity and deposition rate of TiO2 films. The experiment is carried out by sparking-off titanium wires with a high dc voltage of 1 kV (field E-int = 10 kV/cm) and a limited current of 3 mA. The external electric fields (E-ext) of 3, 6, and 9 kV/cm were applied to the sparking system for 1-5 hours. The as-deposited film morphology was characterized by scanning electron microscopy. The results clearly show that the films are only deposited on the external electric field area. Furthermore, the deposition rate of the films increased from 40.7% to 77.8% in the presence of the external electric field of 9 kV/cm. The effects of an external electric field on both the deposition rate and uniformity of films are investigated and described.
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Funding Sponsor
National Research University Project under Thailand's office of the Commission on Higher Education (CHE); Science Achievement Scholarship of Thailand (SAST); Thailand Research Fund (TRF); Graduate School in Chiang Mai University (GSCMU); Center of Excellence in Advanced Materials for Printed Electronics and Sensors (CMU-NECTECH)
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WOS