-
Fabrication and Characterization of Ag朤a Thin Films by Co-Magnetron Sputtering as Alternative Layer for High Reflection of NIR Radiation
- Back
Document Title
Fabrication and Characterization of Ag朤a Thin Films by Co-Magnetron Sputtering as Alternative Layer for High Reflection of NIR Radiation
Author
Phae-Ngam W. Rattana T. Kamoldilok S. Kohmun K. Nakajima H. Triamnak N. Chananonnawathorn C. Hincheeranan W. Horprathum M.
Affiliations
Physics Program Faculty of Science and Technology Phranakhon Rajabhat University Bangkok 10220 Thailand; Department of Physics Faculty of Science Burapha University Chonburi 20131 Thailand; Department of Physics Faculty of Science King Mongkut抯 Institute of Technology Ladkrabang Bangkok 10520 Thailand; Faculty of Science and Technology Rajamagala University of Technology Tawan-ok Chonburi20110 Thailand; Synchrotron Light Research Institute Muang Nakhon Ratchasima 30000 Thailand; Department of Materials Science and Engineering Faculty of Engineering and Industrial Technology Sipakorn University Nakhon Pathom 73000 Thailand; Opto-Electrochemical Sensing Research Team National Electronics and Computer Technology Center Pathum Thani 12120 Thailand
Type
Article
Source Title
Coatings
ISSN
20796412
Year
2023
Volume
13
Issue
1
Open Access
All Open Access Gold
Publisher
MDPI
DOI
10.3390/coatings13010043
Abstract
Silver杢antalum (Ag朤a) thin films were fabricated by magnetron co-sputtering on silicon (Si) wafer (100) and glass slide substrates at room temperature. The Ag朤a thin films were prepared at various deposition times of 5 10 20 and 30 s and the physical structural and optical properties of the Ag朤a thin films were investigated. It was determined that the thicknesses of the films were 7 9 17 and 33 nm respectively. The results revealed that an increase in the film thickness leads to a monotonic increase in FCC and BCC phase of Ag and Ta respectively. The work function and stoichiometric of the Ag朤a thin films were investigated by ultraviolet and X-ray photoemission spectroscopies (UPS and XPS) respectively. The potential of Ag朤a thin films to be used as low-emission coating was investigated using a spectrophotometer. A UV朧IS朜IR spectrophotometer was used to measure the spectral reflectance in the wavelength range from 300 to 2000 nm. The results showed that the Ag朤a thin film deposited for 30 s exhibited higher reflectance in NIR region than those of 5 10 20 and 30 s. It demonstrated an average reflectance of about 80% and slightly decreased to 75% after being kept in the air atmosphere for 28 days. It can be likewise proposed as an alternative thin film with high reflectance of NIR radiation single layer to develop industrial low-emission coating for cost-effective clean and easy adaptation to a large area coating. ? 2022 by the authors.
Keyword
Ag朤a thin film | low-emissivity coating | NIR radiation | reflectance
Industrial Classification
Knowledge Taxonomy Level 1
Knowledge Taxonomy Level 2
Knowledge Taxonomy Level 3
License
CC BY
Rights
Authors
Publication Source
WOS